Spectroellipsometric studies on TiNx films deposited on glass

Optical Engineering

Volumn 35, Issue 5, 1996, Pages 1339-1342

  Pavelescu, Gabriela ^a  

^a NATIONAL INSTITUTE OF MATERIALS PHYSICS   (Romania)

Author keywords

Ellipsometry; Thin film; Tin

Indexed keywords

EID: 0000604427     PISSN: 00913286     EISSN: None     Source Type: Journal    
DOI: 10.1117/1.600625     Document Type: Article

References (5)

1. B. Window and N. Savvides, "Unbalanced d.c. magnetrons as sources of high ion fluxes," J. Vac. Sci. Technol. A 4(3), 453-456 (1986).
2. R. F. Bunshah and C. V. Deshpandey, "Plasma assisted physical vapor deposition processes: a review," J. Vac. Sci. Technol. A 3(3), 553-560 (1985).
3. V. Braic and M. Braic, "Ion beam assisted deposition of TiN hard layers in a three-magnetron sputtering configuration," Le Vide Couch. Minc. 272, 390-393 (1994).
4. T. Takagi, "Role of ions in ion-based film formation," Thin Solid Films 92, 1-17 (1982).
5. H. Oechsner, "Ion and plasma beam assisted thin film deposition," Thin Solid Films 175, 119-127 (1989).