A model of hole trapping in SiO2 films on silicon

Journal of Applied Physics

Volumn 81, Issue 10, 1997, Pages 6822-6824

  Lenahan, P M ^a   Conley Jr , J F ^b   Wallace, B D ^a  

^a PENNSYLVANIA STATE UNIVERSITY   (United States)

^b DYNAMICS RESEARCH CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000583521     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.365438     Document Type: Article

References (15)

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