Electron-beam lithography using a scanning transmission electron microscope CM12 (Philips)

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 16, Issue 3, 1998, Pages 1150-1154

  Lohau, J ^a   Friedrichowski, S ^a   Dumpich, G ^a  

^a UNIVERSITY OF DUISBURG ESSEN   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000562495     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.590025     Document Type: Article

References (11)

1. See, for example, A. D. Kent, S. von Molnar, S. Gider, and D. D. Awschalom, J. Appl. Phys. 76, 6656 (1994).
2. See, for example, S. Y. Chou, M. S. Wei, P. R. Krauss, and P. B. Fischer, J. Appl. Phys. 76, 6673 (1994).
3. H. L. Garvin, E. Garmire, S. Somekh, H. Stoll, and A. Yariv, Appl. Opt. 12, 455 (1973).
4. D. C. Flanders, H. I. Smith, H. W. Lehmann, R. Widmer, and D. C. Shaver, Appl. Phys. Lett. 32, 112 (1978).
5. Nanolithography: A Borderland between STM, EB, IB, and X-Ray Lithographies, edited by M. Gentili, C. Giovannella, and S. Selci, NATO ASI Series E (Kluwer Academic, Dordrecht, 1994), Vol. 264.
6. See, for example, Y. Chen, R. K. Kupka, F. Rosseaux, F. Carcenac, D. Decanini, M. F. Ravet, and H. Launois, J. Vac. Sci. Technol. B 12, 3959 (1994).
7. Electron-Beam Technology in Microelectronic Fabrication, edited by George R. Brewer (Academic, New York, 1980).
8. P. B. Fischer and S. Y. Chou, Microelectron. Eng. 21, 141 (1993).
9. A. N. Broers, J. Cuomo, J. Harper, W. Molzen, R. Laibowitz, and M. Pomerants, Ninth International Congress on Electron Microscopy, Toronto, Ontario, Canada, 1-9 Aug. 1978, pp. 343-354.
10. J. S. Greeneich, J. Vac. Sci. Technol. 19, 1269 (1981).
11. R. M. H. New, R. F. W. Pease, and R. L. White, J. Vac. Sci. Technol. B 12, 3196 (1994).