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Journal of Applied Physics

Volumn 68, Issue 2, 1990, Pages 793-801

Downstream microwave plasma-enhanced chemical vapor deposition of oxide using tetraethoxysilane

(2) Pai, C S a Chang, C P a

a LUCENT TECHNOLOGIES (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000561219 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.346759 Document Type: Article

Times cited : (104)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.