Physicochemical Aspects of Atomic and Molecular Processes in Reactive Plasmas

Advances in Atomic, Molecular and Optical Physics

Volumn 43, Issue C, 2000, Pages 231-241

  Hatano, Yoshihiko ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000547420     PISSN: 1049250X     EISSN: None     Source Type: Book Series    
DOI: 10.1016/S1049-250X(08)60126-3     Document Type: Chapter

References (24)

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