Thin films of metal oxides on silicon by chemical vapor deposition with organometallic compounds. I

Journal of Crystal Growth

Volumn 17, Issue C, 1972, Pages 298-301

  Balog, M ^a   Schieber, M ^a   Patai, S ^a   Michman, M ^a  

^a HEBREW UNIVERSITY OF JERUSALEM   (Israel)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000539086     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/0022-0248(72)90260-6     Document Type: Article

References (24)

1. Deposition and Properties of Aluminum Oxide Obtained by Pyrolytic Decomposition of an Aluminum Alkoxide
2. preparation, properties and optical applications of thin films of titanium dioxide
3. Titanium Printed Capacitors for Microminiaturization
4. High-frequency surface varactors
5. Titanium-dioxide dielectric films prepared by vapor reaction
6. Vapor Deposition of TiO2
7. Mechanism of Heterogeneous Deposition of Thin Film Rutile
8. Cubic Phase Stabilization of Translucent Yttria-Zirconia at Very Low Temperatures
9. Preparation of Ultra-High-Purity Submicron Refractory Oxides
10. Preparation and Properties of Pyrolytic Zirconium Dioxide Films
11. Structural Evaluation of Silicon Oxide Films
12. Measurement of Thickness and Refractive Index of Oxide Films on Silicon
13. La détermination de l'indice et de l'épaisseur des couches minces transparentes
14. Les applications des couches minces en polarimétrie
15. Remarque sur l'influence de la dispersion dans les systèmes de couches minces diélectriques