Ti and Ca substitution in SrRuO3 thin films by sequential deposition process

Applied Physics Letters

Volumn 70, Issue 1, 1997, Pages 126-128

  Mieville L ^a   Geballe, T H ^a   Antognazza, L ^b,c   Char, K ^b  

^a STANFORD UNIVERSITY   (United States)

^b Conductus Incorporated ^*  (United States)

^c UNIVERSITY OF GENEVA   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000535445     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.119283     Document Type: Article

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