Oxygen-related vibrational modes produced in Czochralski silicon by hydrogen plasma exposure

Journal of Applied Physics

Volumn 79, Issue 5, 1996, Pages 2337-2342

  Stein, H J ^a   Medernach, J W ^a  

^a SANDIA NATIONAL LABORATORIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000523866     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.362658     Document Type: Article

References (21)

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