Crystallization and optical nonlinearity in GeO2-SiO2 glass poled with ArF excimer-laser irradiation

Journal of Applied Physics

Volumn 88, Issue 12, 2000, Pages 6993-6996

  Matsumoto, Syuji ^a,c   Fujiwara, Takumi ^a,d   Seno, Yoshiki ^b   Hirose, Yosiharu ^b   Ohama, Motoshi ^a   Ikushima, Akira J ^a  

^a TOYOTA TECHNOLOGICAL INSTITUTE   (Japan)

^b Rd Management Section   (Japan)

^c OKAYAMA UNIVERSITY   (Japan)

^d NAGAOKA UNIVERSITY OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000511020     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1328409     Document Type: Article

References (9)

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