Chemical dry etching mechanisms of GaAs surface by HCI and Cl2

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 14, Issue 5, 1996, Pages 3230-3238

  Senga, Takehito ^a   Matsumi, Yutaka ^a   Kawasaki, Masahiro ^a  

^a HOKKAIDO UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000502254     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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