Synthesis of Polysulfides Containing the Triazeno Group and Their Application as Photoresists in Excimer Laser Polymer Ablation

Chemistry of Materials

Volumn 9, Issue 2, 1997, Pages 485-494

  Nuyken, O ^a   Dahn, U ^a   Ehrfeld, W ^b   Hessel, V ^b   Hesch, K ^b   Landsiedel, J ^b   Diebel, J ^b  

^a TECHNICAL UNIVERSITY OF MUNICH   (Germany)

^b INSTITUT FÜR MIKROTECHNIK MAINZ GMBH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000493362     PISSN: 08974756     EISSN: None     Source Type: Journal    
DOI: 10.1021/cm9603415     Document Type: Article

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28. -1. This must not be the same characteristics as for the polymeric systems. In the future a comparison of the quantum yields of photolysis at 308 and 193 nm with the ablation results (e.g., ablation rate) will help to understand which wavelenghts is the most efficient patterning tool.
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