Molecular dynamics simulation on laser ablation of metal and silicon

International Journal of the Japan Society for Precision Engineering

Volumn 32, Issue 4, 1998, Pages 248-253

  Ohmura, Etsuji ^a   Fukumoto, Ichirou ^a   Miyamoto, Isamu ^a  

^a OSAKA UNIVERSITY   (Japan)

Author keywords

Computer simulation; Evaporation; fcc metal; Laser ablation; Laser materials processing; Molecular dynamics; Silicon; Thermal shock wave

Indexed keywords

EID: 0000491717     PISSN: 0916782X     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (8)

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