Design and fabrication of micromirror supported by electroplated nickel posts

Sensors and Actuators, A: Physical

Volumn 54, Issue 1-3, 1996, Pages 464-467

  Chung, Seok Whan ^a   Shin, Jong Woo ^a   Kim, Yong Kweon ^a   Han, Bong Soo ^b  

^a Seoul National University   (South Korea)

^b SAMSUNG Electronics   (South Korea)

Author keywords

Micromirrors; Nickel electroplating; Reactive ion etching (RIE); Sacrificial layer; Thick photoresist

Indexed keywords

EID: 0000481022     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0924-4247(97)80004-0     Document Type: Article

References (8)

1. J.M. Younse, Mirrors on a chip, IEEE Spectrum, (Nov.) (1993) 27-31.
2. L.J. Hornbeck, Deformable-mirror spatial light modulator, in Spatial Light Modulators and Application III, SPIE Critical Rev., Vol. 1150, 1989, pp. 86-102.
3. M. Fischer, H. Graef and W. von Münch, Electrostatistically deflectable polysilicon torsional mirrors, Sensors and Actuators A, 44 (1994) 83-89.
4. C.W, Storment, D.A. Borkholder, V. Westerlind, J.W. Suh, N.I. Maluf and G.T.A. Kovacs, Flexible, dry-released process for aluminum electrostatic actuators, J. Microelectromech. Syst., 3 (1994) 90-96.
5. C.W. Storment, D.A. Borkholder, V. Westerlind, J.W. Suh, N.I. Maluf and G.T.A. Kovacs, Dry-released process for aluminum electrostatic actuators, Solid-State Sensors and Actuator Workshop, Hilton Head, SC, USA, 13-16 June, 1994, pp. 95-98.
6. N. Takeshima, K.J. Gabriel, M. Ozaki, J. Takahashi, H. Horiguchi and H. Fujita, Electrostatic parallelogram actuators, Proc. 6th Int. Conf. Solid-State Sensors and Actuators (Transducers '91), San Francisco, CA, USA, 24-28 June, 1991, pp. 63-66.
7. L.J. Hornbeck, 128 × 128 deformable mirror devices, IEEE Trans. Electron Devices, 30 (1983) 539-545.
8. A.B. Frazier and M.G. Allen, Metallic microstructures fabricated using photosensitive polyimide electroplating molds, J. Microelectromech. Syst., 2 (1993) 87-94.