Novel approach to surface imaging

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3333, Issue , 1998, Pages 1017-1023

  Spak, Mark A ^a   Mohr, Fred ^a   Bradbury, Ronald ^a   Dammel, Ralph R ^a   Weigold, Jason W ^b   Pang, Stella W ^b  

^a CLARIANT CORPORATION   (United States)

^b UNIVERSITY OF MICHIGAN   (United States)

Author keywords

Bilayer resist; DNQ novolak resist; Dry etch image transfer; Liquid phase silylation

Indexed keywords

LIQUIDS; PHOTORESISTS;

ANTI-REFLECTIVE COATINGS; BILAYER RESIST; CRITICAL DIMENSIONS; DIMENSIONAL CONTROLS; DNQ/NOVOLAK RESIST; DRY ETCH IMAGE TRANSFER; LATENT IMAGES; LIQUID PHASE SILYLATION; LITHOGRAPHIC PROCESS; NEAR SURFACES; NOVOLAK RESISTS; PLANARIZING; RESIST FILMS; RESIST IMAGES; SILYLATION REACTIONS; SPIN-ON; SURFACE IMAGING;

SILANES;

EID: 0000474267     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.312387     Document Type: Conference Paper

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