Primary and secondary processes in the 193 nm photodissociation of vinyl chloride

Journal of Chemical Physics

Volumn 108, Issue 13, 1998, Pages 5414-5425

  Blank, David A ^a   Sun, Weizhong ^a   Suits, Arthur G ^a   Lee, Yuan T ^a   North, Simon W ^b,c   Hall, Gregory E ^b  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b BROOKHAVEN NATIONAL LABORATORY   (United States)

^c TEXAS A AND M UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000449609     PISSN: 00219606     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.475930     Document Type: Article

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