Deep submicron pattern transfer using high density plasma etching and nanochannel glass replica technology

Applied Physics Letters

Volumn 68, Issue 10, 1996, Pages 1397-1399

  Eddy Jr , C R ^a   Tonucci, R J ^a   Pearson, D H ^a  

^a NAVAL RESEARCH LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000437680     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.116092     Document Type: Article

References (12)

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12. C. R. Eddy, Jr., R. J. Tonucci, D. H. Pearson, J. R. Meyer, and C. A. Hoffman, in Proceedings of the 7th International Conference on Narrow Gap Semiconductors (Institute of Physics Conference Series Number 144), edited by J. L. Reno (IOP, Philadelphia, PA, 1995), p. 364.