Production and characterization of a fully ionized He plasma channel

Applied Physics Letters

Volumn 77, Issue 25, 2000, Pages 4112-4114

  Gaul, E W ^a   Le Blanc, S P ^a   Rundquist, A R ^a   Zgadzaj, R ^a   Langhoff, H ^a,b   Downer, M C ^a  

^a UNIVERSITY OF TEXAS AT AUSTIN   (United States)

^b UNIVERSITY OF WÜRZBURG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000432896     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1329323     Document Type: Article

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