Contact stiffness of layered materials for ultrasonic atomic force microscopy

Journal of Applied Physics

Volumn 87, Issue 10, 2000, Pages 7491-7496

  Yaralioglu, G G ^a   Degertekin, F L ^a   Crozier, K B ^a   Quate, C F ^a  

^a STANFORD UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000404671     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.373014     Document Type: Article

References (16)

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14. ANSYS, Inc., 201 Johnson Road, Houston, PA 15342-0065.
15. Following ANSYS nonlinear analysis options autots, Insrch, and pred have been used.
16. By using our UAFM setup, we measured the change in the resonance frequency of a particular mode of a silicon cantilever when it is in contact with silicon and photoresist substrates. In this case, 60 kHz change in the resonance frequency corresponds to 714 N/m change in the surface stiffness. The minimum detectable resonance frequency change in our setup is 850 Hz which results in a 10 N/m detectable change in the surface stiffness provided that the tip-sample force is constant.