Agglomeration of TiSi2 thin film on (100) Si substrates

Journal of Applied Physics

Volumn 82, Issue 6, 1997, Pages 2933-2937

  Rha, J J ^a   Park, J K ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000398745     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.366127     Document Type: Article

References (8)

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