Thermal expansion of LaAlO3 and (La,Sr)(Al,Ta)O3, substrate materials for superconducting thin-film device applications

Journal of Applied Physics

Volumn 83, Issue 4, 1998, Pages 1979-1982

  Chakoumakos, B C ^a   Schlom, D G ^b   Urbanik, M ^c   Luine, J ^d  

^a OAK RIDGE NATIONAL LABORATORY   (United States)

^b PENNSYLVANIA STATE UNIVERSITY   (United States)

^c Comml Crystal Laboratories Inc ^*  (United States)

^d NORTHROP GRUMMAN CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000397038     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.366925     Document Type: Article

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