Stress distribution in an aluminum interconnect of very large scale integration

Journal of Applied Physics

Volumn 68, Issue 1, 1990, Pages 328-333

  Niwa, H ^a   Yagi, H ^a   Tsuchikawa, H ^a   Kato, Masaharu ^b  

^a FUJITSU LABORATORIES LTD   (Japan)

^b TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000365719     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.347137     Document Type: Article

References (21)