Fabrication of silicon field emitter arrays integrated with beam focusing lens

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 35, Issue 12 SUPPL. B, 1996, Pages 6626-6628

  Yamaoka, Yoshikazu ^a,b   Kanemaru, Seigo ^a   Itoh, Junji ^a  

^a ELECTROTECHNICAL LABORATORY   (Japan)

^b SANYO ELECTRIC CO LTD   (Japan)

Author keywords

Electrostatic focusing lens; FEA; Field emission; Field emitter array; Focused electron beam; Vacuum microelectronics

Indexed keywords

EID: 0000365129     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.35.6626     Document Type: Article

References (6)

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3. C. Py, J. Itoh, T. Hirano and S. Kanemaru: Bull. Electrotech. Lab. 59 (1995) 32.
4. S. Kanemaru, H. Hiroshima and J. Itoh: Ext. Abstr. (44th Autumun Meet., 1994); The Japan Society of Applied Physics, 21p-ZQ-7 [in Japanese].
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6. K. Betsui: Tech. Dig. Int. Vacuum Microelectronics Conf(IVMC'91) (Nagahama, Japan, 6-9 Sept, 1991) p. 26.