In-Situ Contact Electrical Resistance Technique for Investigating Corrosion Inhibitor Adsorption on Copper Electrodes

Corrosion

Volumn 54, Issue 2, 1998, Pages 135-144

  Moretti, G ^a   Molokanov, V V ^b   Quartarone, G ^a   Zingales, A ^a  

^a CA' FOSCARI UNIVERSITY OF VENICE   (Italy)

^b RUSSIAN ACADEMY OF SCIENCES   (Russian Federation)

Author keywords

1 hydroxybenzotriazole; Acidic solutions; Benzotriazole; Contact electrical resistance technique; Copper; Halogenyde; Inhibitors; Oxide films; Sulfate; Thiocyanate

Indexed keywords

EID: 0000351119     PISSN: 00109312     EISSN: None     Source Type: Journal    
DOI: 10.5006/1.3284837     Document Type: Article

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