FeAlN/SiO2 and FeAlN/Al2O3 multilayers for thin-film recording heads (invited)

Journal of Applied Physics

Volumn 73, Issue 10, 1993, Pages 6212-6217

  Kryder, M H ^a   Wang, S ^a   Rook, K ^a  

^a CARNEGIE MELLON UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000323708     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.352702     Document Type: Article

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