Effect of interfacial silicon on the structural stability of C54-TiSi2 on SiO2

Applied Physics Letters

Volumn 76, Issue 25, 2000, Pages 3697-3699

  Suh, Dongwoo ^a   Kim, Hong Seung ^a   Kang, Jin Yeong ^a  

^a Electronics and Telecommunications Research Institute (ETRI)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000321906     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.126753     Document Type: Article

References (7)

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