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Chemical Vapor Deposition

Volumn 3, Issue 6, 1997, Pages 306-309

Fabrication of Polycrystalline LaAlO3 Films on Si(100): An MOCVD Application of the Second-Generation La(hfa)3 · Diglyme Precursor

(3) Malandrino, Graziella a Frassica, Amalia a Fragalà, Ignazio L a

a UNIVERSITY OF CATANIA (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000292184 PISSN: 09481907 EISSN: None Source Type: Journal
DOI: 10.1002/cvde.19970030604 Document Type: Article

Times cited : (23)

References (18)

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