Negative differential resistance on the atomic scale: Implications for atomic scale devices

Science

Volumn 245, Issue 4924, 1989, Pages 1369-1371

  Lyo, In Whan ^a   Avouris, Phaedon ^a  

^a IBM T J WATSON RESEARCH CENTER   (United States)

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[No Author keywords available]

Indexed keywords

EID: 0000292142     PISSN: 00368075     EISSN: None     Source Type: Journal    
DOI: 10.1126/science.245.4924.1369     Document Type: Article

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