Neutral electron trap generation in SiO2 by hot holes

Applied Physics Letters

Volumn 56, Issue 14, 1990, Pages 1329-1331

  Ogawa, Shigeo ^a   Shiono, Noboru ^a   Shimaya, Masakazu ^a  

^a NTT CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000287106     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.103200     Document Type: Article

References (16)