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Volumn 69, Issue 4, 1998, Pages 1792-1799

The use of a high-pressure scanning tunneling microscope as a lithography tool for modifications of amorphous hydrogenated carbon films

Author keywords

[No Author keywords available]

Indexed keywords


EID: 0000282398     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1148843     Document Type: Article
Times cited : (7)

References (14)
  • 1
    • 0039686717 scopus 로고
    • Nanolithography: A Borderland between STM, EB, IB, and X-Ray lithographies
    • Kluwer Academic, Dordrecht
    • Nanolithography: A Borderland Between STM, EB, IB, and X-Ray lithographies, edited by M. Gentili, C. Giovannella, and S. Selci, NATO ASI Series E: Applied Sciences (Kluwer Academic, Dordrecht, 1994). Vol. 264
    • (1994) NATO ASI Series E: Applied Sciences , vol.264
    • Gentili, M.1    Giovannella, C.2    Selci, S.3
  • 5
    • 85034299538 scopus 로고    scopus 로고
    • Digital Instruments, 520 East Montecito Street, Santa Barbara, CA 93103
    • Digital Instruments, 520 East Montecito Street, Santa Barbara, CA 93103.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.