On the low resistance Au/Ge/Pd ohmic contact to n-GaAs

Journal of Applied Physics

Volumn 79, Issue 8, 1996, Pages 4211-4215

  Hao, P H ^a   Wang, L C ^a   Deng, Fei ^b   Lau, S S ^b   Cheng, J Y ^c  

^a Texas AandM University   (United States)

^b UNIVERSITY OF CALIFORNIA   (United States)

^c LUCENT TECHNOLOGIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000275298     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.361788     Document Type: Article

References (13)

1. T. Sands, E. D. Marshall, and L. C. Wang, J. Mater. Res. 3, 914 (1988).
2. L. C. Wang, Mater. Res. Soc. Symp. Proc. 319, 93 (1994).
3. E. D. Marshall, W. X. Chen, C. S. Wu, S. S. Lau, and T. F. Kuech, Appl. Phys. Lett. 47, 298 (1985).
4. L. C. Wang, S. S. Lau, E. K. Hsieh, and J. R. Velebir, Appl. Phys. Lett. 54, 2677 (1989).
5. D. B. Slater, Jr., P. M. Enquist, J. A. Hutchby, A. S. Morris, and R. J. Trew, IEEE Electron Device Lett. 15, 154 (1994).
6. A. Paccagnella, C. Canali, G. Donzelli, E. Zanoni, L. C. Wang, and S. S. Lau, Electron. Lett. 24, 708 (1988).
7. L. S. Yu, L. C. Wang, E. D. Marshall, S. S. Lau, and T. F. Kuech, J. Appl. Phys. 65, 1621 (1989).
8. E. D. Marshall, B. Zhang, L. C. Wang, P. F. Jiao, W. X. Chen, T. Sawada, S. S. Lau, K. L. Kavanagh, and T. F. Kuech, J. Appl. Phys. 62, 942 (1987).
9. L. C. Wang, P. H. Hao, and B. J. Wu, Appl. Phys. Lett. 67, 509 (1995).
10. H. H. Herger, Solid State Electron. 15, 145 (1972).
11. For example, Y. C. Shih, M. Murakami, E. L. Wilkie, and A. C. Callegari, J. Appl. Phys. 62, 582 (1987).
12. S. S. Lau, and W. F. van der Weg, in Thin Films - Interdiffusion and Reactions, edited by J. M. Poate, K. N. Tu, and J. M. Mayer (Wiley, New York, 1978), Chap. 12.
13. C. J. Palmstrøm, D. V. Morgan, and M. J. Howes, Nucl. Instrum. Methods 150, 305 (1978).