Reaction field treatment of charge penetration

Journal of Chemical Physics

Volumn 112, Issue 13, 2000, Pages 5558-5565

  Chipman, Daniel M ^a  

^a UNIVERSITY OF NOTRE DAME   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000262725     PISSN: 00219606     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.481133     Document Type: Article

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