Deposition and extensive light soaking of highly pure hydrogenated amorphous silicon

Applied Physics Letters

Volumn 68, Issue 17, 1996, Pages 2380-2382

  Kamei, Toshihiro ^a   Hata, Nobuhiro ^a   Matsuda, Akihisa ^a   Uchiyama, Toyoshi ^b   Amano, Shigeru ^b   Tsukamoto, Kazuyoshi ^c   Yoshioka, Yoshiaki ^c   Hirao, Takashi ^c  

^a ELECTROTECHNICAL LABORATORY   (Japan)

^b ULVAC INC   (Japan)

^c Matsushita Technoresearch Inc   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000253141     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.116140     Document Type: Article

References (14)

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