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Volumn 195, Issue 1-2, 1988, Pages 307-329

Adsorption kinetics of SiH4, Si2H6 and Si3H8 on the Si(111)-(7×7) surface

Author keywords

[No Author keywords available]

Indexed keywords


EID: 0000239384     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/0039-6028(88)90798-4     Document Type: Article
Times cited : (222)

References (29)
  • 8
    • 84918482478 scopus 로고    scopus 로고
    • S.M. Gates, unpublished results.
  • 10
    • 84918482476 scopus 로고    scopus 로고
    • 4 studies are intended for future studies with a differentially pumped QMS due to the excessive exposure required.
  • 13
    • 84918482474 scopus 로고    scopus 로고
    • R. Buss and P. Ho, private communication.
  • 17
    • 84996152895 scopus 로고
    • A study of nucleation in chemically grown epitaxial silicon films using molecular beam techniques III. Nucleation rate measurements and the effect of oxygen on initial growth behaviour
    • and references therein
    • (1967) Philosophical Magazine , vol.15 , pp. 1167
    • Joyce1    Bradley2    Booker3
  • 21
    • 0001460629 scopus 로고
    • Bond activation sequence observed in the chemisorption and surface reaction of ethanol on Ni(111)
    • (1986) Surface Science , vol.174 , pp. 111
    • Gates1    Russell2    Yates3
  • 22
    • 84918482378 scopus 로고    scopus 로고
    • R. Imbihl, J.E. Demuth, S.M. Gates and B.A. Scott, in preparation.
  • 29
    • 84918482377 scopus 로고    scopus 로고
    • 4 are in the literature [25]. The energies with respect to the vacuum and the Rydberg character of all these states is approximately the same for all three molecules.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.