Far-infrared absorption by interstitial oxygen impurities in silicon crystals

Physical Review B - Condensed Matter and Materials Physics

Volumn 58, Issue 11, 1998, Pages 7002-7006

  Yamada Kaneta, H ^a  

^a FUJITSU LABORATORIES LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000214516     PISSN: 10980121     EISSN: 1550235X     Source Type: Journal    
DOI: 10.1103/PhysRevB.58.7002     Document Type: Article

References (10)

1. D. R. Bosomworth, W. Hayes, A. R. L. Spray, and G. D. Watkins, Proc. R. Soc. London, Ser. A 317, 133 (1970).
2. H. Yamada-Kaneta, C. Kaneta, and T. Ogawa, Phys. Rev. B 47, 9338 (1993).
3. H. J. Hrostowski and R. H. Kaiser, Phys. Rev. 107, 966 (1957).
4. H. J. Hrostowski and B. J. Alder, J. Chem. Phys. 33, 980 (1960).
5. B. Pajot, J. Phys. Chem. Solids 28, 73 (1967).
6. K. Krishnan and S. L. Hill, in Fourier Transform Infrared Spectroscopy, edited by H. Sakai (SPIE, Bellingham, WA, 1981), p. 221.
7. B. Pajot, H. J. Stein, B. Cales, and C. Naud, J. Electrochem. Soc. 132, 3034 (1985).
8. B. Pajot and B. Cales, in Oxygen, Carbon, Hydrogen and Nitrogen in Crystalline Silicon, MRS Symp. Proc. No. 59, edited by J. C. Mikkelsen, Jr., S. J. Pearton, J. W. Corbett, and S. J. Pennycook (Materials Research Society, Pittsburgh, 1986), p. 39.
9. H. Yamada-Kaneta, C. Kaneta, and T. Ogawa, Phys. Rev. B 42, 9650 (1990).
10. H. Yamada-Kaneta, C. Kaneta, and T. Ogawa, Mater. Sci. Forum 83-87, 419 (1992).