Numerical and experimental study of disordered multilayers for broadband x-ray reflection

Applied Optics

Volumn 35, Issue 19, 1996, Pages 3614-3619

  van Loevezijn, P ^a   Schlatmann, R ^a   Verhoeven, J ^a   van Tiggelen, B A ^b   Gullikson, E M ^c  

^a FOM INSTITUTE AMOLF   (Netherlands)

^b CNRS   (France)

^c LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

Author keywords

Disordered multilayers; X ray optics

Indexed keywords

EID: 0000193124     PISSN: 1559128X     EISSN: 21553165     Source Type: Journal    
DOI: 10.1364/AO.35.003614     Document Type: Article

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