Metastable ion study of organosilicon compounds. Part X. o-CH3C6H4COOSi(CH3)3 and o-CF3C6H4COOSi(CH3)3

International Journal of Mass Spectrometry and Ion Processes

Volumn 161, Issue 1-3, 1997, Pages 133-139

  Mori, Shigeru ^a   Koitabashi, Risei ^b   Sekiguchi, Osamu ^b   Tajima, Susumu ^b  

^a SHIN ETSU CHEMICAL CO LTD   (Japan)

^b GUNMA NATIONAL COLLEGE OF TECHNOLOGY   (Japan)

Author keywords

B E linked scan; F compounds; Metastable ion; Ortho effect; Si compounds

Indexed keywords

EID: 0000191230     PISSN: 01681176     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0168-1176(96)04471-0     Document Type: Article

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