Adhesion in growth of defect-free silicon over silicon oxide

Journal of Applied Physics

Volumn 80, Issue 7, 1996, Pages 4101-4107

  Raidt, H ^a   Kohler R ^a   Banhart, F ^b   Jenichen, B ^c   Gutjahr, A ^d   Konuma, M ^d   Silier, I ^d   Bauser, E ^d  

^a Max Planck Arbeitsgruppe H   (Germany)

^b MAX PLANCK INSTITUTE FOR INTELLIGENT SYSTEMS   (Germany)

^c PAUL DRUDE INSTITUT FÜR FESTKÖRPERELEKTRONIK   (Germany)

^d MAX PLANCK INSTITUT FÜR FESTKÖRPERFORSCHUNG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000188350     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.363371     Document Type: Article

References (19)

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