Low-voltage operation of a plasma reactor for exhaust gas treatment by dielectric barrier discharge

Review of Scientific Instruments

Volumn 69, Issue 4, 1998, Pages 1847-1849

  Jani, Muaffaq A ^a   Takaki, K ^a   Fujiwara, T ^a  

^a IWATE UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000181052     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1148854     Document Type: Article

References (5)

1. G. Dinelli, L. Civitano, and M. Rea, IEEE Trans. Ind. Appl. 26, 535 (1990).
2. M. Higashi, S. Uchida, N. Suzuki, and K. Fuji, IEEE Trans. Plasma Sci. 20, 1 (1992).
3. S. K. Dhali and I. Sardja, J. Appl. Phys. 69, 6319 (1991).
4. E. M. van Veldhuizen, W. R. Rutgers, and V. A. Bityurin, Plasma Chem. Plasma Process. 16, 227 (1996).
5. K. Takaki, T. Suzuki, S. Maekawa, H. Yamada, and T. Fujiwara, Proceedings of the 12th International Conference on Gas Discharges and Their Applications, Greifswald, Germany, 1997, p. 1-392.