Experimental and computer simulation studies of diffusion mechanisms on the arsenic sublattice of gallium arsenide

Journal of Applied Physics

Volumn 83, Issue 10, 1998, Pages 5295-5301

  Schultz, M ^a   Egger, U ^a   Scholz, R ^a   Breitenstein, O ^a   Gosele U ^a   Tan, T Y ^b  

^a MAX PLANCK INSTITUTE OF MICROSTRUCTURE PHYSICS   (Germany)

^b Duke University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000174334     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.367354     Document Type: Article

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