Application of dry etching process on high-end Cr photomasks

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3412, Issue , 1998, Pages 246-251

  Park, Keun Taek ^a   Lee, Kyu Yong ^a  

^a DuPont Photomasks Inc   (United States)

Author keywords

CD uniformity; Corner rounding; Dry etching; Pattern loading; Resolution; Side slope; Wet etching

Indexed keywords

CHROMIUM; DRY ETCHING; PHOTOLITHOGRAPHY; PHOTORESISTS; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR DEVICE STRUCTURES;

CORNER ROUNDING; PATTERN LOADING; SIDE SLOPE; WET ETCHING;

MASKS;

EID: 0000170626     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.328814     Document Type: Conference Paper

References (4)

1. Tom Coleman & Peter Buck, "Plasma etching of chrome films in the fabrication of photomasks", 15th Annual Symposium of Photomask Technology and Management, SPIE Vol. 2621, pp 62-72
2. C. Constanite, D.J. Johnson, R.J. Westerman, "Plasma etching of Cr photomasks - Parametric comparison of plasma source and process conditions", SPIE Vol. 3096, pp 11-18
3. Peter Buck & Brain Grenon, "A comparison of wet and dry chrome etching with the CORE2564", Proc., 13th Annual Symposium of Photomask Technology and Management, Vol. 2087, pp 42-49 (1993)
4. Tom Coleman & Peter Buck, "Plasma etching of Cr films in the fabrication of photomasks", SPIE(BACUS) Vol. 13, issues 3. pp 4-10 (1997)