The Development of Chemically Amplified Positive- and Negative-tone Resists for DUV Lithography

Journal of Photopolymer Science and Technology

Volumn 7, Issue 3, 1994, Pages 619-630

  Thackeray, James W ^a   Adams, Timothy ^a   Cronin, Michael F ^a   Denison, Mark ^a   Fedynyshyn, Theodore H ^a   Georger, Jacque ^a   Mori, J Michael ^a   Orsula, George W ^a   Sinta, Roger ^a  

^a SHIPLEY COMPANY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000160225     PISSN: 09149244     EISSN: 13496336     Source Type: Journal    
DOI: 10.2494/photopolymer.7.619     Document Type: Article

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