Oxygen chemisorption and oxide film growth on Ni{100}, {110}, and {111}: Sticking probabilities and microcalorimetric adsorption heats

Journal of Chemical Physics

Volumn 106, Issue 5, 1997, Pages 2012-2030

  Stuckless, J T ^a,b   Wartnaby, C E ^a,c   Al Sarraf, N ^a,d   Dixon Warren, St J B ^a,e   Kovar, M ^a,f   King, D A ^a  

^a UNIVERSITY OF CAMBRIDGE   (United Kingdom)

^b UNIVERSITY OF WASHINGTON   (United States)

^c Pi Research Ltd   (United Kingdom)

^d LEHMAN BROTHERS   (United States)

^e WASHINGTON STATE UNIVERSITY   (United States)

^f UNIVERSITY OF WESTERN ONTARIO   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000120194     PISSN: 00219606     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.473308     Document Type: Article

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