Analytic model of power deposition in inductively coupled plasma sources

Journal of Applied Physics

Volumn 78, Issue 3, 1995, Pages 1446-1458

  Vahedi, V ^a   Lieberman, M A ^b   Dipeso, G ^a   Rognlien, T D ^a   Hewett, D ^a  

^a LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

^b UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000099308     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.360723     Document Type: Article

References (0)