A proposal of a composite phase-shifting mask for 0.15-μm hole-pattern delineation using KrF exposure

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3334, Issue , 1998, Pages 522-531

  Hasegawa, Norio ^a   Hayano, Katsuya ^a   Imai, Akira ^a   Asai, Naoko ^a   Okazaki, Shinji ^a  

^a HITACHI LTD   (Japan)

Author keywords

Alternating PSM; Composite phase shifting mask; Focus latitude; Hole pattern; Octagonal outrigger half tone PSM

Indexed keywords

CHROMIUM; KRYPTON; MASKS; MICROMETERS; PULSE MODULATION; THICKNESS MEASUREMENT;

ALTERNATING-PSM; COMPOSITE PHASE-SHIFTING MASK; FOCUS LATITUDE; HOLE PATTERN; OCTAGONAL OUTRIGGER HALF-TONE PSM;

OPTICAL RESOLVING POWER;

EID: 0000087666     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.310781     Document Type: Conference Paper

References (8)

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