Transport anisotropy in microcrystalline silicon studied by measurement of ambipolar diffusion length

Journal of Applied Physics

Volumn 89, Issue 3, 2001, Pages 1800-1805

  Svrcek V ^a   Pelant, I ^a   Kocka J ^a   Fojtik P ^a   Rezek, B ^a   Stuchlikova H ^a   Fejfar, A ^a   Stuchlik J ^a   Poruba, A ^a   Tousek J ^b  

^a INSTITUTE OF PHYSICS   (Czech Republic)

^b CHARLES UNIVERSITY   (Czech Republic)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000067639     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1338996     Document Type: Article

References (19)

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