Structural properties of amorphous silicon carbide films by plasma-enhanced chemical vapor deposition

Journal of Applied Physics

Volumn 77, Issue 2, 1995, Pages 827-832

  Choi, W K ^a   Chan, Y M ^a   Ling, C H ^a   Lee, Y ^a   Gopalakrishnan, R ^a   Tan, K L ^a  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000066759     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.359006     Document Type: Article

References (17)