Formation of Pb inclusions in Si by ion implantation

Materials Science Forum

Volumn 269-272, Issue PART 1, 1998, Pages 345-350

  Touboltsev, V S ^a   Johnson, E ^a   Dahmen, U ^b   Johansen, A ^a   Sarholt, L ^a   Xiao, S Q ^b  

^a UNIVERSITY OF COPENHAGEN   (Denmark)

^b LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

Author keywords

Ion beam channelling; Ion implantation; Lead nanocrystals; Melting solidification; Transmission electron microscopy

Indexed keywords

EID: 0000057954     PISSN: 02555476     EISSN: 16629752     Source Type: Book Series    
DOI: 10.4028/www.scientific.net/msf.269-272.345     Document Type: Article

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