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Physical Review B

Volumn 39, Issue 8, 1989, Pages 5070-5078

Influence of thin interfacial silicon oxide layers on the Schottky-barrier behavior of Ti on Si(100)

(1) Aboelfotoh, M O a

a IBM T J WATSON RESEARCH CENTER (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000052184 PISSN: 01631829 EISSN: None Source Type: Journal
DOI: 10.1103/PhysRevB.39.5070 Document Type: Article

Times cited : (69)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.