Infrared ellipsometry study of the thickness-dependent vibration frequency shifts in silicon dioxide films

Journal of the Optical Society of America A: Optics and Image Science, and Vision

Volumn 12, Issue 8, 1995, Pages 1797-1804

  Ossikovski, Razvigor ^a   Drevillon, Bernard ^a   Firon, Muriel ^b  

^a LABORATOIRE DE PHYSIQUE DES INTERFACES ET DES COUCHES MINCES   (France)

^b PSL RESEARCH UNIVERSITY   (France)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000047776     PISSN: 10847529     EISSN: 15208532     Source Type: Journal    
DOI: 10.1364/JOSAA.12.001797     Document Type: Article

References (23)

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