Growth of laser-induced damage during repetitive illumination of HfO 2-SiO2 multilayer mirror and polarizer coatings

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2966, Issue , 1997, Pages 273-282

  Génin, Francois Y ^a   Stolz, Christopher J ^a   Kozlowski, Mark R ^a  

^a LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

Author keywords

1064 nm; Damage growth; Damage morphology; Hafnia silica mirrors and polarizers; Laser induced damage

Indexed keywords

COATINGS; GROWTH (MATERIALS); HAFNIUM COMPOUNDS; HIGH POWER LASERS; LASER DAMAGE; LASERS; MORPHOLOGY; MULTILAYERS; OPTICAL INSTRUMENTS; OPTICAL MATERIALS; OPTICAL PROJECTORS; OXIDES; POLARIZATION; SILICA; SILICON COMPOUNDS;

1064 NM; BEAM EVAPORATIONS; CRITICAL FLUENCE; DAMAGE GROWTH; DAMAGE MORPHOLOGY; DAMAGE STABILITIES; DAMAGE THRESHOLDS; FLUENCE; FLUENCES; GROWTH BEHAVIORS; HAFNIA-SILICA MIRRORS AND POLARIZERS; HIGH POWERS; MULTILAYER MIRRORS; NUMBER OF SHOTS;

MIRRORS;

EID: 0000045035     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.274244     Document Type: Conference Paper

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